Evaluación de procesos fotoquímicos de oxidación avanzada para la inactivación y/o reactivación de una cepa de Candida albicans
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Date
2024
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Publisher
Universidad Santiago de Cali
Abstract
Candida albicans is a priority fungal pathogen for the OMS, opportunistic, causing diseases in skin, mucous membranes, and invasive fungal infections with very high mortality rates. This study determined the effect of some advanced oxidation processes on the inactivation and reactivation rate of a C. albicans strain. For this, 9 inactivation assays (PDS, PMS, H2O2, UVC, PDS/UVC, PMS/UVC, H2O2/UVC, Photo-Fenton pH 3.4, Photo-Fenton pH 7.29) and 4 reactivation assays (UVC, PDS/UVC, PMS/UVC, H2O2/UVC) were performed. The best results were obtained with the UVC/PMS and UVC/H2O2 combinations with 100% removal at 30 seconds (s), followed by UVC/PDS from 45s and UVC light at 60s. The oxidants PMS achieved 98% removal at 60s; PDS 89% at 80s; H2O2 60% at 80s. The Photo-Fenton process showed a maximum removal of 41% and 50% at pH 3.4 and 7.29, respectively, at 60s. Regarding the reactivation of the C. albicans strain, it was determined that the minimum exposure time for the inhibition of C. albicans without reactivation was 45s for PMS/UVC and 60s for UVC, PDS/UVC, and H2O2/UVC. In conclusion, these advanced oxidation processes were effective methods for the inhibition of a C. albicans strain, with the PMS/UVC assays being the most efficient, followed by H2O2/UVC, PDS/UVC, UVC light, PMS, PDS, and finally, H2O2
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Keywords
: Candida Albicans, Inactivación/Reactivación, Luz UV, Procesos de Oxidación Avanzada
Citation
Zamora Adrada, Emerson Yesid ;Guerrero Rivera, D. (2024). Evaluación de procesos fotoquímicos de oxidación avanzada para la inactivación y/o reactivación de una cepa de Candida albicans. Universidad Santiago de Cali.